Issue 28, 2016
From the journal:

RSC Advances

Large-scale nanopatterning of metal surfaces by target-ion induced plasma sputtering (TIPS)†

Tae-Sik Jang,a   Sungwon Kim,a   Hyun-Do Jung,b   Jin-Wook Chung,c   Hyoun-Ee Kim,a   Young-Hag Kohd  and  Juha Song*a  

* Corresponding authors

a Department of Materials Science and Engineering, Seoul National University, Seoul, Korea
E-mail: sat105@snu.ac.kr

b Liquid Processing & Casting R&D Group, Korea Institute of Industrial Technology, Incheon 406-840, Korea

c Department of Radiology, Seoul National University College of Medicine, Seoul, Korea

d School of Biomedical Engineering, Korea University, Seoul, Korea

Abstract

Target-ion induced plasma sputtering (TIPS) is a one-step self-organization nanofabrication method in which a conventional DC magnetron sputter with a negative substrate bias voltage is used. This process successfully leads to ion-induced sputtering on metal substrates, producing large-scale nanopatterns on various metal surfaces. We demonstrated that the obtained nanopatterns have size-tunability from nano- to micro-scales by modulating the negative substrate voltage. This large-scale, bottom-up nanofabrication technique will accelerate nanopattern applications in biomedical, chemical or magnetic devices through large surface-to-volume ratios and unique surface topography of induced ripple patterns on metals.

Graphical abstract: Large-scale nanopatterning of metal surfaces by target-ion induced plasma sputtering (TIPS)

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Article information

DOI
https://doi.org/10.1039/C6RA00443A
Article type
Communication
Submitted
07 Jan 2016
Accepted
26 Feb 2016
First published
26 Feb 2016

RSC Adv., 2016,6, 23702-23708

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Large-scale nanopatterning of metal surfaces by target-ion induced plasma sputtering (TIPS)

T. Jang, S. Kim, H. Jung, J. Chung, H. Kim, Y. Koh and J. Song, RSC Adv., 2016, 6, 23702 DOI: 10.1039/C6RA00443A

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